High voltage device and manufacturing method thereof

ABSTRACT

The present invention discloses a high voltage device and a manufacturing method thereof. The high voltage device is formed in a first conductive type substrate, wherein the substrate includes isolation regions defining a device region. The high voltage device includes: a drift region, located in the device region, doped with second conductive type impurities; a gate in the device region and on the surface of the substrate; and a second conductive type source and drain in the device region, at different sides of the gate respectively. From top view, the concentration of the second conductive type impurities of the drift region is distributed substantially periodically along horizontal and vertical directions.

CORRESPONDING REFERENCE

The present invention claims priority to TW 100108936, filed on Mar. 16,2011.

BACKGROUND OF THE INVENTION

1. Field of Invention

The present invention relates to a high voltage device and amanufacturing method of a high voltage device; particularly, it relatesto such device and manufacturing method wherein the breakdown voltage isincreased.

2. Description of Related Art

FIGS. 1A and 1B show a cross-section view and a 3D (3-dimensional) viewof a prior art double diffused drain metal oxide semiconductor (DDDMOS)device, respectively. As shown in FIGS. 1A and 1B, a P-type substrate 11has multiple isolation regions 12 by which a device region 100 isdefined. The isolation region 12 for example is a shallow trenchisolation (STI) structure or a local oxidation of silicon (LOCOS)structure, the former being shown in the figures. The DDDMOS device isformed in the device region 100, which includes a gate 13, a driftregion 14, a drain 15, and a source 16. The drift region 14, drain 15and the source 16 are formed by a lithography process and an ionimplantation process, wherein the lithography process defines theimplantation regions by a photoresist mask together with aself-alignment effect provided by all or part of the gate 13 and theisolation regions 12, and the ion implantation implants N-typeimpurities to the defined regions in the form of accelerated ions. Thedrain 15 and the source 16 are beneath the gate 13 and at differentsides thereof respectively. Part of the drift region 14 is locatedbeneath the gate 13 near the drain. The DDDMOS device is a high voltagedevice designed for applications requiring higher operation voltages.However, if it is required for the DDDMOS device to be integrated with alow voltage device in one substrate, the high voltage device and the lowvoltage device should adopt the same manufacturing process steps withthe same ion implantation parameters, and thus the flexibility of theion implantation parameters for the DDDMOS device is limited; as aresult, the DDDMOS device will have a lower breakdown voltage andtherefore a limited application range. To increase the breakdown voltageof the DDDMOS device, additional manufacturing process steps arerequired, that is, an additional lithography process and an additionalion implantation process are required in order to provide different ionimplantation parameters, but this increases the cost.

FIGS. 2A and 2B show a cross-section view and a 3D view of a prior artlateral diffused metal oxide semiconductor (LDMOS) device. Compared tothe prior art shown in FIGS. 1A and 1B, the LDMOS device shown in FIGS.2A and 2B has a body region 17 and a body electrode 18, and part of itsgate 13 is located on the isolation region 12. Still similarly, when theLDMOS device is integrated with a low voltage device in one substrate,the high voltage device and the low voltage device should adopt the samemanufacturing process steps with the same ion implantation parameters,and thus the flexibility of the ion implantation parameters for theLDMOS device is limited; as a result, the LDMOS device will have a lowerbreakdown voltage and therefore a limited application range. To increasethe breakdown voltage of the LDMOS device, additional manufacturingprocess steps are required, that is, an additional lithography processand an additional ion implantation process are required in order toprovide different ion implantation parameters, but this increases thecost.

In view of above, to overcome the drawbacks in the prior art, thepresent invention proposes a high voltage device and a manufacturingmethod thereof which provide a higher breakdown voltage so that the highvoltage device may have a broader application range, in which additionalmanufacturing process steps are not required such that the high voltagedevice can be integrated with and a low voltage device and manufacturedby common manufacturing process steps.

SUMMARY OF THE INVENTION

The first objective of the present invention is to provide a highvoltage device.

The second objective of the present invention is to provide amanufacturing method of a high voltage device.

To achieve the objectives mentioned above, from one perspective, thepresent invention provides a high voltage device, which is formed in afirst conductive type substrate, the substrate having a device regiondefined by at least one isolation region, the high voltage deviceincluding: a drift region, which is located in the device region anddoped with second conductive type impurities, wherein from top view, aconcentration of the second conductive type impurities of the driftregion is distributed substantially periodically along horizontal andvertical directions; a gate, which is formed on a surface of thesubstrate; and a second conductive type source, and a second conductivetype drain, which are formed at two sides of the gate in the deviceregion respectively.

In one embodiment of the high voltage device, the drift regionpreferably includes a first drift region and a second drift region,which are between the source and the gate, and between the drain and thegate respectively.

In another preferable embodiment, the drift region is formed by processsteps of lithography and ion implantation which also form a secondconductive type well of another device in the substrate.

In another preferable embodiment, the concentration distribution of thesecond conductive type impurities of the drift region is in a form of aplurality of concentric circular loops each having closed or opencorners.

From another perspective, the present invention provides a manufacturingmethod of a high device, including: providing a substrate having a firstconductive type well and a device region defined by at least oneisolation region; forming a drift region in the device region by dopingsecond conductive type impurities, wherein from top view, aconcentration of the second conductive type impurities of the driftregion is distributed substantially periodically along horizontal andvertical directions; forming a gate in the device region on a surface ofthe substrate; and forming a second conductive type source and a secondconductive type drain at two sides of the gate in the device regionrespectively, wherein the source and the drain are separated by thedrift region.

In one embodiment of the manufacturing method, the step of forming thedrift region preferably includes: defining a photoresist layer on thesubstrate by a photo mask, such that the photoresist layer has asubstantially periodical pattern along the horizontal and verticaldirection from top view; implanting the second conductive typeimpurities into the substrate; and thermally diffusing the secondconductive type impurities to form the drift region.

In another embodiment of the manufacturing method, the photo maskpreferably has a pattern including at least one circular loop.

The objectives, technical details, features, and effects of the presentinvention will be better understood with regard to the detaileddescription of the embodiments below.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1A shows a cross-section view of a conventional DDDMOS device.

FIG. 1B shows a 3D view of the conventional DDDMOS device.

FIG. 2A shows a cross-section view of a conventional LDMOS device.

FIG. 2B shows a 3D view of the conventional LDMOS device.

FIGS. 3A-3E show a first embodiment of the present invention.

FIGS. 4A, 4B and 4C show examples of concentration distributions of thesecond conductive type impurities of the drift region in the embodimentsof the present invention.

FIGS. 5A and 5B show another embodiment of the present invention.

FIG. 5C shows an example of the concentration distribution of the secondconductive type impurities of the drift region in the embodiment of thepresent invention.

FIGS. 6A and 6B shows another embodiment of the present invention.

DESCRIPTION OF THE PREFERRED EMBODIMENTS

The drawings as referred to throughout the description of the presentinvention are for illustration only, to show the interrelations betweenthe regions and the process steps, but not drawn according to actualscale.

Please refer to FIGS. 3A-3E for a first embodiment according to thepresent invention, wherein FIG. 3A shows a schematic 3D view of a DDDMOSdevice of the present invention. It should be noted that, in order tobetter illustrate the major feature of the present invention, the gate13 and the substrate 11 are shown separately in FIG. 3A, but they shouldbe in contact with each other in a practical device. As shown in FIG.3A, in the substrate 11, isolation regions 12 are formed to define thedevice region 100, wherein the substrate 11 is, for example but notlimited to, a P-type substrate (or an N-type substrate in anotherembodiment), and the isolation region 12 is, for example, an STI or aLOCOS structure (the former being shown in FIG. 3A). And as shown inFIG. 3A, a gate 13, drift region 14 a, drain 15, and source 16 areformed in the device region 100, wherein the source 16 and drain 15 are,for example but not limited to N-type, and are formed at two sides ofthe gate 13 in the device region 100 respectively, separated by the gate13 from top view (not shown). The drift region 14 a is doped with secondconductive type impurities, for example but not limited to N-type. Thisembodiment is different from the prior art in that, the concentration ofthe second conductive type impurities of the drift region 14 a isdistributed substantially periodically along the horizontal and verticaldirection; in one embodiment as shown in the top view of FIG. 3B, theconcentration distribution presents as multiple concentric rectangularloops. The grid-shaded regions in the figure indicate higherconcentration regions of the second conductive type impurities, and thegrey regions between the grid-shaded regions indicate lowerconcentration regions of the second conductive type impurities. Thisarrangement has the following advantages: First, in devicespecification, the present invention enhances the breakdown voltage ofthe DDDMOS device. Second, in manufacturing process, no additional maskor process steps are required if the DDDMOS device is manufactured in awafer including other low voltage devices, as typically in a generalcase; in this case, the drift region 14 a can be formed by the samelithography and implantation process steps for forming a secondconductive type well of the low voltage device. Note that what isdescribed is an NMOS device as an example; the high voltage DDDMOSdevice may be a PMOS device, and in this case the conductivities of thedoped regions should be reversed, that is, the P-type regions should bereplaced by N-type regions and the N-type regions should be replaced byP-type regions.

FIG. 3C shows a schematic cross-section view of steps for forming thedrift region 14 a of this embodiment. As shown in FIG. 3C, a photoresistlayer 14 c is formed on the substrate 11 and defined by a photo mask,such that the photoresist layer 14 c has a substantially periodicalpattern along the horizontal and vertical directions from top view, suchas multiple concentric rectangular loops as shown in FIG. 3B. The secondconductive type impurities are implanted into the open regions definedby the photoresist layer 14 c in the substrate 11 in the form ofaccelerated ions, as indicated by the dashed arrow lines, such thatregions 14 b of the second conductive type impurities are formed in thesubstrate 11 which have a periodical pattern of concentrationdistribution. After thermal process steps, the second conductive typeimpurities of the regions 14 b thermally diffuse to form the driftregion 14 a as indicated by the dashed arrow lines shown in FIG. 3D.From top view, the photoresist layer 14 c includes a concentric patternhaving multiple donut-shaped rectangular loops, such that theconcentration distribution of the second conductive type impurities ofthe drift region 14 a is as shown in FIG. 3E, that is, substantiallyperiodical along the horizontal and vertical directions (the horizontalaxis x in FIG. 3E indicating the position, and the vertical axis N inFIG. 3E indicating the concentration of the impurities).

The concentration distribution of the second conductive type impuritiesof the drift region 14 a is substantially periodical along thehorizontal and vertical directions, but it is not limited to the form ofmultiple concentric rectangular loops as indicated in FIG. 3B. Forexample, the concentration distribution pattern of the drift region 14 amay instead be a pattern as shown in FIG. 4A (wherein the circular loopshave open corners, unlike FIG. 3B wherein the circular loops have closedcorners), or multiple concentric circular loops as shown in FIG. 4B, ora matrix pattern as shown in FIG. 4C, etc. In summary, the concentrationdistribution may be arranged in any pattern as long as the concentrationof the second conductive type impurities is distributed substantiallyperiodically along the horizontal and vertical directions.

FIGS. 5A and 5B show another embodiment of the present invention. FIG.5A shows a schematic 3D view of an LDMOS device of the presentinvention. It should be noted that, in order to better illustrate themajor feature of the present invention, the gate 13 and the substrate 11are shown separately in FIG. 5A, but they should be in contact with eachother in a practical device. As shown in FIG. 5A, in the substrate 11,isolation regions 12 are formed to define the device region 100, whereinthe substrate 11 is, for example but not limited to, a P-type substrate(or an N-type substrate in another embodiment), and the isolation region12 is, for example, an STI or a LOCOS structure (the latter being shownin FIG. 5A). And as shown in FIG. 5A, a gate 13, drift region 14 a,drain 15, source 16, body region 17, and body electrode 18 are formed inthe device region 100, wherein the source 16 and drain 15 are, forexample but not limited to N-type, and are formed at two sides of thegate 13 in the device region 100 respectively, separated by the gate 13from top view (not shown). The body region 17 and the body electrode 18are, for example but not limited to P-type. The drift region 14 a isdoped with second conductive type impurities, for example but notlimited to N-type. This embodiment is different from the prior art inthat, the concentration of the second conductive type impurities of thedrift region 14 a is distributed substantially periodically along thehorizontal and vertical directions; in one embodiment as shown in thetop view of FIG. 5B, the concentration distribution presents as multipleconcentric rectangular loops. The grid-shaded regions in the figureindicate higher concentration regions of the second conductive typeimpurities, and the grey regions between the grid regions indicate lowerconcentration regions of the second conductive type impurities. Thisarrangement has the following advantages: First, in devicespecification, the present invention enhances the breakdown voltage ofthe LDMOS device. Second, in manufacturing process, no additional maskor process steps are required if the LDMOS device is manufactured in awafer including other low voltage devices, as typically in a generalcase; in this case, the drift region 14 a can be formed by the samelithography and implantation process steps for forming a secondconductive type well of the low voltage device. Note that what isdescribed is an NMOS device as an example; the high voltage LDMOS devicemay be a PMOS device, and in this case the conductivities of the dopedregions should be reversed, that is, the P-type regions should bereplaced by N-type regions and the N-type regions should be replaced byP-type regions.

The concentration distribution of the second conductive type impuritiesof the drift region 14 a is substantially periodical along thehorizontal and vertical directions, but it is not limited to the form ofmultiple concentric rectangular loops as indicated in FIG. 5B. Forexample, the concentration distribution pattern of the drift region 14 amay instead be a matrix pattern as shown in FIG. 5C, etc. Certainly, theconcentration distribution may be arranged in any other pattern as longas the concentration of the second conductive type impurities isdistributed substantially periodically along the horizontal and verticaldirections.

FIGS. 6A and 6B show another example of the present invention. FIG. 6Ashows a schematic 3D view of a DDDMOS device of the present invention.This embodiment is different from the first embodiment in that, theDDDMOS device of this embodiment is a symmetrical high voltage device.As shown in FIGS. 6A and 6B, the drift region 14 a includes two driftregions 14 a, which are formed between the source 16 and the gate 13,and between the drain 15 and the gate 13 respectively, and from topview, both drift regions 14 a have concentration distributions of thesecond conductive type impurities which are substantially periodicalalong the horizontal and vertical directions. The two drift regions 14 afor example are formed by the same lithography process and the same ionimplantation process.

The present invention has been described in considerable detail withreference to certain preferred embodiments thereof. It should beunderstood that the description is for illustrative purpose, not forlimiting the scope of the present invention. Those skilled in this artcan readily conceive variations and modifications within the spirit ofthe present invention. For example, other process steps or structureswhich do not affect the primary characteristics of the device, such as adeep well, etc., can be added. For another example, the lithography stepdescribed in the above can be replaced by electron beam lithography,X-ray lithography, etc. For yet another example, that the concentrationdistribution is substantially periodical, should not be interpreted asan exact periodical repeat of peaks and valleys at the same levels andat fixed intervals; instead, there may be deviations. For anotherexample, the pattern of the loops is not limited to rectangular andcircular, and it may for example be hexagonal or octagonal, etc. In viewof the foregoing, the spirit of the present invention should cover allsuch and other modifications and variations, which should be interpretedto fall within the scope of the following claims and their equivalents.

What is claimed is:
 1. A manufacturing method of a high voltage devicecomprising: providing a substrate having a first conductive type welland a device region defined by at least one isolation region; forming adrift region in the device region by doping second conductive typeimpurities, wherein from top view, a concentration of the secondconductive type impurities of the drift region is distributed in apattern of a plurality of concentric loops and substantiallyperiodically along horizontal and vertical directions, wherein theconcentric loops includes a plurality of first loops doped with arelatively lower concentration of the second conductive type impuritiesand a plurality of second loops doped with a relatively higherconcentration of the second conductive type impurities, wherein thefirst loops and the second loops are arranged in an alternating order;forming a gate in the device region on a surface of the substrate; andforming a second conductive type source and a second conductive typedrain at two sides of the gate in the device region respectively,wherein the source and the drain are separated by the drift region. 2.The manufacturing method of claim 1, wherein the drift region includes afirst drift region and a second drift region, which are between thesource and the gate, and between the drain and the gate respectively. 3.The manufacturing method of claim 1, wherein the drift region is formedby process steps of lithography and ion implantation which also form asecond conductive type well of another device in the substrate.
 4. Themanufacturing method of claim 1, wherein the step of forming the driftregion includes: defining a photoresist layer on the substrate by aphoto mask, such that the photoresist layer has the pattern of theplurality of concentric loops from top view; implanting the secondconductive type impurities into the substrate; and thermally diffusingthe second conductive type impurities to form the drift region.
 5. Themanufacturing method of claim 1, wherein the pattern of a plurality ofconcentric loops has open corners.